ABSTRACT
Thin-film technology is the basis of astounding developments in solid-state electronics. The thin films can be obtained either by physical methods (e.g., thermal evaporation, sputtering, epitaxial growth) or by chemical methods (e.g., anodization, chemical vapor deposition (CVD), chemical bath, electrodeposition). Physical methods are expensive but give relatively more reliable and more reproducible results. Most of the chemical methods are cost-effective, but their full potential for obtaining device quality films has not been fully explored in many cases. Electroplating is the simplest of the chemical methods, and it is rather surprising that efforts to obtain good quality semiconductor films have only recently started.
