ABSTRACT

Chapter 8 describes various methods used to create nanoscale structures. A direct printing method using a polymer stamp is described. Also included in this chapter are methods used for the deposition of thin metallic films on substrates or nonconductive samples as a pretreatment method for scanning electron microscope imaging. Readers will also find a description of chemical vapor deposition (CVD) in this chapter. This is a method involving the decomposition of a carbon containing gas for the assembly of carbon nanotubes or graphene sheets. The second half of Chapter 8 describes routine nanofabrication equipment used in academic and industrial laboratories. These techniques include etch (wet and dry), e-beam lithography, focused ion beam (FIB) milling, and photolithography.