ABSTRACT
Developing a reactor for a luminous chemical vapor deposition (LCVD) operation to deal with large numbers of materials to be coated, probably the most difficult problem encountered is how to hold the substrates, place them in appropriate position, and move them in the luminous gas phase. In order to coat large number of substrate uniformly, the movement of substrate within the luminous gas phase is a mandatory requirement, with the exception of direct current (DC) cathodic LCVD. The difficulty progressively increases as the size of the substrate decreases, and it becomes virtually impossible to hold as the size reaches millimeters or less. For instance, the surface of small particulate matters cannot be treated or coated by the conventional modes of LCVD in which substrates are held by some kind of holder.
