ABSTRACT
Because of the unique growth mechanism of material formation, the monomer for plasma polymerization (luminous chemical vapor deposition, LCVD) does not require specific chemical structure. The monomer for the free radical chain growth polymerization, e.g., vinyl polymerization, requires an olefinic double bond or a triple bond. For instance, styrene is a monomer but ethylbenzene is not. In LCVD, both styrene and ethylbenzene polymerize, and their deposition rates are by and large the same. Table 7.1 shows the comparison of deposition rate of vinyl compounds and corresponding saturated vinyl compounds.
