ABSTRACT
An electrode system equipped with a superimposed magnetic field is generally referred to as a ‘‘magnetron’’ [1]. Magnetrons have been widely used in sputter deposition of metals and alloys; however, their use in the plasma deposition of organic and inorganic materials [plasma polymerization or luminous chemical vapor deposition (LCVD)] has been relatively uncommon [2]. The reason magnetrons have not been used widely in plasma polymerization might be associated with the opposing concepts of sputter deposition and plasma polymerization. Namely, the main use of magnetrons is to sputter the target material placed on the cathode for the physical deposition of the sputtered materials. In many applications of plasma polymerization, on the other hand, the inclusion of electrode material in the polymeric deposition has been viewed as contamination. Thus, magnetron glow discharge has been widely conceived as incompatible with plasma polymerization.
