ABSTRACT
Plasma polymerization in a low-pressure regime inevitably reduces the deposition rate of the process. However, the deposition rate obtainable by magnetron discharge is significantly higher than that by nonmagnetron discharge. Hence, the reasonable deposition rates could be obtained in low-pressure regime by employing magnetron discharge. Whereas publications dealing with magnetron glow discharge polymerization are few compared to those of general glow discharge polymerization without magnetic enhancement, nearly all relatively large-scale industrial applications (outside of microelectronic applications) of glow discharge polymerization are more or less limited to the use of magnetron glow discharge [6,7]. This trend undoubtedly reflects the importance of magnetron glow discharge in large-scale applications of plasma polymerization.
