ABSTRACT
When a¼ 0, the system is essentially a closed system, although the sealing is not good and gas leaks to the outside of the glass tube. Data made under such a condition still provide some fundamental aspects of sputtering, although the operation under such a condition has no relevance to practical use of AMT. Figures 17.24-17.26 depict the relationship between sputtering rate and the electrode distance under total physical confinement (gap distance a¼ 0 cm). Figure 17.24 shows the case with a strong magnetic field (B//max¼ 1550G). With the gap distance less than 6.0 cm, the materials sputtered near the edge of the physical confinement wall deposit in the center part. This trend decreases as the gap distance is increased. With the gap distance above 7 cm, the radial distribution of sputtering rate is uniform and nearly independent of the gap distance.
