ABSTRACT
It is important to recognize that gas used in such a secondary plasma treatment should be non-polymer-forming reactive gas such as H2, O2, NH3, H2O, CF4, etc. If polymer-forming vapor or monomer is used, the deposition occurs mainly in the glow and the coating of electrodes occurs quickly. Thus, the secondary plasma reactor under the operational conditions selected for such a reactor cannot achieve an effective deposition of material. The species that escape from the primary glow discharge zone are oligomeric species that quench on contact with substrate surface, and the yield of material deposition is too low for serious consideration.
