Plasma Chemical Vapor Deposition (PCVD)
DOI link for Plasma Chemical Vapor Deposition (PCVD)
Plasma Chemical Vapor Deposition (PCVD) book
This chapter analyses selected topics on the plasma chemical vapor deposition (PCVD) of thin films. The coatings deposited by PCVD can be broadly characterized as polymeric, non-polymeric, amorphous, and crystalline. PCVD is of three types such as plasma polymerization, plasma epitaxy and heterogeneous chemical reactions, each of which finds a variety of uses in microelectronic and other applications. The chapter describes polymeric thin-film deposition because of its importance to microelectronics and other major industrial sectors. A potential biomedical application of thin films is in the culture of tissue and micro-organisms, in which the surfaces must be relatively wettable by the fluids and nutrients involved. The subject of polymeric PCVD thin films includes a wide variety of morphological structures, including classical linear polymers, in which monomers, the basic building blocks, are linked in long repeating linear chains. On a larger scale of size, PCVD methods are used to form macroelectronic devices for use in hybrid or ordinary electronic circuits.