ABSTRACT
This chapter examines the ion implantation and thermal diffusion interactions, and examines the technology and results of industrial applications. The implantation of ions into a thin surface layer has been found to have important effects on the surface-related properties of materials. The most widespread application of ion implantation is the doping of semiconductors in the microelectronic industry. Ion implantation can be used to improve the characteristics of superconducting thin films. Without pulsing, the ion current in the asymptotic, constant part of the waveform may cause overheating of the surface of the workpiece and thermal diffusion of the ions into its interior. In low-energy plasma thermal diffusion treatment, the workpiece surface is heated, either by ion bombardment or by placing the entire workpiece in an external furnace. A repetition frequency of 200 Hz is adequate for most applications, while 1 kHz may lead to thermal diffusion of the implanted ions.
