ABSTRACT

Chemical vapor deposition (CVD) is a technique of modifying properties of surfaces of engineering components by depositing a layer or layers of another metal or compound through chemical reactions in a gaseous medium surrounding the component at an elevated temperature. In formal terms, CVD may be defined as a technique in which a mixture of gases interacts with the surface of a substrate at a relatively high temperature, resulting in the decomposition of some of the constituents of the gas mixture and the formation of a solid film of coating of a metal or a compound on the substrate.