ABSTRACT
A b s tra c t . We report on the fabrication of microaccelerometer structures in bonded siliconon-insulator material employing a focused ion beam technique. Silicon-on-insulator starting m aterial allows the simple fabrication of suspended microstructures with the advantages of single crystal silicon. Focused ion beam machining is essential for modification without a photolithographic resist mask. In particular for the milling of narrow trenches at oblique angles an ion beam has advantages over other etching techniques. We show that milling times can be held short enough to consider this process for manufacturing devices. We also demonstrate novel applications of focused ion beams for prototyping MEMS.
