Wrinkling atop Shape Memory Polymers
DOI link for Wrinkling atop Shape Memory Polymers
Wrinkling atop Shape Memory Polymers book
The žrst systematic investigation of the wrinkling phenomenon in a thin elastic žlm deposited atop a polymer was probably reported by Bowden et al. (1998); polydimethylsiloxane (PDMS) was used as the substrate. This wrinkling phenomenon, resulting from the buckling of the žlm due to a strain mismatch between a polymer substrate and elastic thin žlm atop it, attracts great interest from many researchers. The system may be the most convenient and easiest approach to achieving surface features with different patterns for many engineering applications. Various types of polymers and techniques have utilized the wrinkling phenomenon since then. For example, Chung et al. (2009) deposited polystyrene (PS) dissolved in toluene atop a silicon wafer by spin casting. After UV oxidation of the surface layer, the toluene vaporized and wrinkles were produced atop the PS žlm.