ABSTRACT
Colloidal stability in relatively high solids loading systems under extreme conditions can be achieved by creating a steric barrier due to the surfactant aggregate structures adsorbed at the solid-liquid interface. Guidelines for the design of robust and optimal performing dispersions were developed based on the repulsive force and friction force interactions. A typical application such as high performance slurry in the CMP process can be fine-tuned to provide stability (high repulsive force barrier) under extreme conditions (high ionic strength, pH), as well as optimal polishing performance (high friction force). All the results discussed in this study provide just a glimpse to the myriad of applications of the AFM in the field of colloid science.
