ABSTRACT
Silica or polystyrene (PS) microspheres have been demonstrated as microlenses for the UV light to focus the light into a spot that is much smaller than the wavelength of light.12 Using this concept, a close-packed nanosphere array has been used as a phase-shifting lithography mask to fabricate 2D13-16 or 3D17 nanostructures. This method is usually referred to as “nanosphere photolithography.” Since the nanospheres are functioning as nanoscale spherical lenses to focus the incident UV light to perform nanoscale exposure of PR, we preferred to call it to as “nanospherical-lens lithography (NLL)” in our previous journal publications.18-20 In this chapter, fabrications of 2D nanostructures using the NSL and NLL are demonstrated. Both methods are low-cost and high-throughput methods and exhibit great potentials for industrial applications.
