ABSTRACT
This chapter discusses points that are necessary for fully understanding the nuances inherent in forming directed fluxes of low-temperature plasma generated by a high-voltage gas discharge outside the electrode gap. The occurrence of a high-voltage discharge is caused by nonuniform distribution of the electric field, achieved through the use of specially designed electrodes in gas-discharge devices. The device is capable of creating directed large-format fluxes of low-temperature plasma generated by a high-voltage gas discharge outside the electrode gap, with active plasma particles moving along the normal to the substrate surface. The device generates several low-temperature plasma fluxes in the hole area simultaneously. This device falls into the class of gas-discharge devices used for forming directed fluxes of low-temperature off-electrode plasma and generating convergent and divergent high-current ion–electron beams. The problem can be solved by equipping a gas-discharge plasma focuser with a cathode, gauze anode, insulation, and high-voltage cable gland.
