ABSTRACT
The study cycle described in the monograph attests to the promising prospects for the line of scientific work that relates to using new off-electrode plasma techniques and equipment for fabricating optical microreliefs and micro- and nanostructures. This new equipment differs from conventional equipment in that it is both simple and versatile. These new techniques and equipment help solve a major problem in diffractive optics: how to implement a series of off-electrode plasma processes for fabricating diffraction microstructures on large-aperture wafers. The monograph experimentally proves how efficient off-electrode plasma is for cleaning substrate surfaces, for enhancing the adhesion of thin metal films, and for generating catalytic masks to fabricate microreliefs, as well as for plasma-chemical and ion-chemical etching. The scientific data help expand the existing theoretical knowledge about processes involved in interaction between low-temperature plasma and the surface. The results stimulate new developments in gas discharge physics, plasma physics, solid-state physics, and diffractive and computer diffractive optics.
